Step and flash imprint lithography: a new approach to high-resolution patterning M Colburn, SC Johnson, MD Stewart, S Damle, TC Bailey, B Choi, ... Emerging Lithographic Technologies III 3676, 379-389, 1999 | 1060 | 1999 |
Step and flash imprint lithography: Template surface treatment and defect analysis T Bailey, BJ Choi, M Colburn, M Meissl, S Shaya, JG Ekerdt, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000 | 513 | 2000 |
Mammalian cells preferentially internalize hydrogel nanodiscs over nanorods and use shape-specific uptake mechanisms R Agarwal, V Singh, P Jurney, L Shi, SV Sreenivasan, K Roy Proceedings of the National Academy of Sciences 110 (43), 17247-17252, 2013 | 439 | 2013 |
Step and repeat imprint lithography processes SV Sreenivasan, BJ Choi, NE Schumaker, RD Voisin, MPC Watts, ... US Patent 7,077,992, 2006 | 439 | 2006 |
Template for room temperature, low pressure micro-and nano-imprint lithography T Bailey, BJ Choi, M Colburn, SV Sreenivasan, CG Willson, J Ekerdt US Patent 6,696,220, 2004 | 422 | 2004 |
Formation of discontinuous films during an imprint lithography process BJ Choi, MJ Meissl, SV Sreenivasan, MPC Watts US Patent 6,932,934, 2005 | 384 | 2005 |
Step and repeat imprint lithography systems SV Sreenivasan, MPC Watts, BJ Choi, MJ Meissl, NE Schumaker, ... US Patent 6,900,881, 2005 | 330 | 2005 |
Alignment systems for imprint lithography SV Sreenivasan, MPC Watts, BJ Choi, RD Voisin, NE Schumaker US Patent 7,070,405, 2006 | 289 | 2006 |
Method for imprint lithography using an electric field SV Sreenivasan, RT Bonnecaze, CG Willson US Patent 6,908,861, 2005 | 246 | 2005 |
High precision orientation alignment and gap control stages for imprint lithography processes BJ Choi, SV Sreenivasan, SC Johnson US Patent 6,873,087, 2005 | 245 | 2005 |
Alignment methods for imprint lithography SV Sreenivasan, MPC Watts, BJ Choi, RD Voisin US Patent 6,916,584, 2005 | 243 | 2005 |
Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography P Ruchhoeft, M Colburn, B Choi, H Nounu, S Johnson, T Bailey, S Damle, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1999 | 212 | 1999 |
Method to arrange features on a substrate to replicate features having minimal dimensional variability SV Sreenivasan, MPC Watts US Patent 8,349,241, 2013 | 203 | 2013 |
Step & flash imprint lithography DJ Resnick, SV Sreenivasan, CG Willson Materials today 8 (2), 34-42, 2005 | 199 | 2005 |
Nanoimprint lithography steppers for volume fabrication of leading-edge semiconductor integrated circuits SV Sreenivasan Microsystems & nanoengineering 3 (1), 1-19, 2017 | 186 | 2017 |
Imprint lithography for integrated circuit fabrication DJ Resnick, WJ Dauksher, D Mancini, KJ Nordquist, TC Bailey, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003 | 183 | 2003 |
Design of orientation stages for step and flash imprint lithography BJ Choi, SV Sreenivasan, S Johnson, M Colburn, CG Wilson Precision Engineering 25 (3), 192-199, 2001 | 177 | 2001 |
Stability and traction control of an actively actuated micro‐rover SV Sreenivasan, BH Wilcox Journal of robotic systems 11 (6), 487-502, 1994 | 172 | 1994 |
Development and advantages of step-and-flash lithography M Colburn, T Bailey, BJ Choi, JG Ekerdt, SV Sreenivasan, CG Willson Solid State Technology 44 (7), 67-80, 2001 | 170 | 2001 |
Step and flash imprint lithography for sub-100-nm patterning M Colburn, A Grot, MN Amistoso, BJ Choi, TC Bailey, JG Ekerdt, ... Emerging Lithographic Technologies IV 3997, 453-457, 2000 | 170 | 2000 |