| Efficient search of compositional space for hybrid organic–inorganic perovskites via Bayesian optimization HC Herbol, W Hu, P Frazier, P Clancy, M Poloczek npj Computational Materials 4 (1), 51, 2018 | 98 | 2018 |
| Secondary electrons in EUV lithography J Torok, R Del Re, H Herbol, S Das, I Bocharova, A Paolucci, LE Ocola, ... Journal of Photopolymer Science and Technology 26 (5), 625-634, 2013 | 81 | 2013 |
| Metal–organic framework-inspired metal-containing clusters for high-resolution patterning H Xu, K Sakai, K Kasahara, V Kosma, K Yang, HC Herbol, J Odent, ... Chemistry of Materials 30 (12), 4124-4133, 2018 | 80 | 2018 |
| Computational implementation of nudged elastic band, rigid rotation, and corresponding force optimization HC Herbol, J Stevenson, P Clancy Journal of Chemical Theory and Computation 13 (7), 3250-3259, 2017 | 39 | 2017 |
| Cost-effective materials discovery: Bayesian optimization across multiple information sources HC Herbol, M Poloczek, P Clancy Materials Horizons 7 (8), 2113-2123, 2020 | 28 | 2020 |
| Studying secondary electron behavior in EUV resists using experimentation and modeling A Narasimhan, S Grzeskowiak, B Srivats, HC Herbol, L Wisehart, C Kelly, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 27-38, 2015 | 26 | 2015 |
| Bypassing solid-state intermediates by solvent engineering the crystallization pathway in hybrid organic–inorganic perovskites AG Ortoll-Bloch, HC Herbol, BA Sorenson, M Poloczek, LA Estroff, ... Crystal Growth & Design 20 (2), 1162-1171, 2019 | 19 | 2019 |
| Electron penetration depths in EUV photoresists J Torok, B Srivats, S Memon, H Herbol, J Schad, S Das, L Ocola, ... Journal of Photopolymer Science and Technology 27 (5), 611-615, 2014 | 18 | 2014 |
| How well do implicit solvation models represent intermolecular binding energies in organic-inorganic solutions? BA Sorenson, SS Hong, HC Herbol, P Clancy Computational Materials Science 170, 109138, 2019 | 11 | 2019 |
| Evaluating printability of buried native EUV mask phase defects through a modeling and simulation approach M Upadhyaya, V Jindal, A Basavalingappa, H Herbol, J Harris-Jones, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 204-217, 2015 | 10 | 2015 |
| Studying thickness loss in extreme ultraviolet resists due to electron beam exposure using experiment and modeling A Narasimhan, S Grzeskowiak, B Srivats, H Herbol, L Wisehart, J Schad, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (4), 043502-043502, 2015 | 9 | 2015 |
| Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects M Upadhyaya, A Basavalingappa, H Herbol, G Denbeaux, V Jindal, ... Journal of Vacuum Science & Technology B 33 (2), 2015 | 9 | 2015 |
| Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach M Upadhyaya, V Jindal, A Basavalingappa, H Herbol, J Harris-Jones, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (2), 023505-023505, 2015 | 4 | 2015 |
| Investigating printability of native defects on EUV mask blanks through simulations and experiments M Upadhyaya, V Jindal, H Herbol, IY Jang, HJ Kwon, J Harris-Jones, ... Extreme Ultraviolet (EUV) Lithography V 9048, 851-857, 2014 | 2 | 2014 |
| Measurement of the role of secondary electrons in EUV resist exposures G Denbeaux, J Torok, R Del Re, H Herbol, S Das, I Bocharova, A Paolucci, ... Proc. Int. Workshop on EUV Lithography, 2013 | 2 | 2013 |
| The role of secondary electrons in EUV resist G Denbeaux, J Torok, B Srivats, S Memon, H Herbol, J Schad, S Das, ... International workshop on EUV lithography. Maui, Hawaii, 2014 | 1 | 2014 |
| Developing particle detection test bench for vacuum components Y Khopkar, H Herbol, M Upadhyaya, G Denbeaux, V Jindal, P Kearney Extreme Ultraviolet (EUV) Lithography III 8322, 660-666, 2012 | 1 | 2012 |
| Algorithmic Advances in Reactive Chemical Systems HC Herbol Cornell University, 2019 | | 2019 |
| Simple Molecular Reactive Force Field-a Novel Approach to Capturing Bond-Making and-Breaking HC Herbol, P Clancy 2018 AIChE Annual Meeting, 2018 | | 2018 |
| Lancelot-an Open-Source Codebase for Simplified Computational Chemistry HC Herbol, J Stevenson, Y Acevedo, A Ruttinger, P Clancy 2018 AIChE Annual Meeting, 2018 | | 2018 |
Greg DenbeauxSUNY Albany, College of Nanotechnology, Science, and EngineeringПотвърден имейл адрес: albany.edu
