Следене
J. Michael Klopf
J. Michael Klopf
FEL Beamline Scientist, Helmholtz-Zentrum Dresden-Rossendorf (HZDR)
Потвърден имейл адрес: hzdr.de
Заглавие
Позовавания
Позовавания
Година
Femtosecond pump–probe nondestructive examination of materials
PM Norris, AP Caffrey, RJ Stevens, JM Klopf, JT McLeskey, AN Smith
Review of scientific instruments 74 (1), 400-406, 2003
2122003
Thin film non-noble transition metal thermophysical properties
AP Caffrey, PE Hopkins, JM Klopf, PM Norris
Microscale thermophysical engineering 9 (4), 365-377, 2005
882005
Nanoscale‐Confined Terahertz Polaritons in a van Der Waals Crystal
TVAG de Oliveira, T Nörenberg, G Álvarez‐Pérez, L Wehmeier, ...
Advanced Materials 33 (2), 2005777, 2021
682021
High power operation of the JLab IR FEL driver accelerator
S Benson, K Beard, G Biallas, J Boyce, D Bullard, J Coleman, D Douglas, ...
2007 IEEE Particle Accelerator Conference (PAC), 79-81, 2007
492007
Influence of interband transitions on electron-phonon coupling measurements in Ni films
PE Hopkins, JM Klopf, PM Norris
Applied Optics 46 (11), 2076-2083, 2007
392007
Sub-diffractional cavity modes of terahertz hyperbolic phonon polaritons in tin oxide
FH Feres, RA Mayer, L Wehmeier, FCB Maia, ER Viana, A Malachias, ...
Nature communications 12 (1), 1995, 2021
352021
Time-resolved light-induced insulator-metal transition in niobium dioxide and vanadium dioxide thin films
MR Beebe, JM Klopf, Y Wang, S Kittiwatanakul, J Lu, SA Wolf, ...
Optical Materials Express 7 (1), 213-223, 2017
312017
Successful user operation of a superconducting radio-frequency photoelectron gun with Mg cathodes
J Teichert, A Arnold, G Ciovati, JC Deinert, P Evtushenko, M Justus, ...
Physical Review Accelerators and Beams 24 (3), 033401, 2021
302021
The Jefferson Lab high power THz user facility
M Klopf, GP Williams, A Todd
Optical Terahertz Science and Technology, TuD2, 2007
302007
Phonon-induced near-field resonances in multiferroic BiFeO3 thin films at infrared and THz wavelengths
L Wehmeier, T Nörenberg, TVAG de Oliveira, JM Klopf, SY Yang, ...
Applied Physics Letters 116 (7), 2020
262020
Nonthermal nature of photoinduced insulator-to-metal transition in
R Rana, JM Klopf, J Grenzer, H Schneider, M Helm, A Pashkin
Physical Review B 99 (4), 041102, 2019
262019
Distinct Length Scales in the VO {sub 2} Metal–Insulator Transition Revealed by Bi-chromatic Optical Probing
L Wang, IB Novikova, JM Klopf, SE Madaras, GP Williams, E Madaras, ...
Advanced Optical Materials 2 (JLAB-FEL-14-1794; DOE/OR-23177-2975), 2014
252014
A proposed VUV oscillator-based FEL upgrade at Jefferson Lab
SV Benson, DR Douglas, P Evtushenko, FE Hannon, ...
Journal of Modern Optics 58 (16), 1438-1451, 2011
232011
Transfer mask for high-aspect-ratio microlithography
Y Vladimirsky, O Vladimirsky, V Saile, KJ Morris, JM Klopf
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for …, 1995
221995
DC high voltage conditioning of photoemission guns at Jefferson Lab FEL
C Hernandez‐Garcia, SV Benson, G Biallas, D Bullard, P Evtushenko, ...
AIP Conference Proceedings 1149 (1), 1071-1076, 2009
212009
PMMA as an x-ray resist for micro-machining application: latent image formation and thickness losses
Y Vladimirsky, O Vladimirsky, KJ Morris, GM Calderon, V Saile, JM Klopf
Proceedings of the international conference on Micro-and nanofabrication …, 1996
211996
Far-Infrared Near-Field Optical Imaging and Kelvin Probe Force Microscopy of Laser-Crystallized and -Amorphized Phase Change Material Ge3Sb2Te6
J Barnett, L Wehmeier, A Heßler, M Lewin, J Pries, M Wuttig, JM Klopf, ...
Nano Letters 21 (21), 9012-9020, 2021
192021
X-ray microlithography exposure system for high aspect ratio micromachining
Y Vladimirsky, KJ Morris, JM Klopf, O Vladimirsky, V Saile
Microlithography and Metrology in Micromachining 2640, 36-44, 1995
181995
Laser nitriding of niobium for application to superconducting radio-frequency accelerator cavities
S Singaravelu, JM Klopf, G Krafft, MJ Kelley
Journal of Vacuum Science & Technology B 29 (6), 2011
172011
Terahertz pump–probe of liquid water at 12.3 THz
F Novelli, C Hoberg, EM Adams, JM Klopf, M Havenith
Physical Chemistry Chemical Physics 24 (2), 653-665, 2022
162022
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